Publication Type Journal Article
Title Residual stress and dislocations density in silicon ribbons grown via optical zone melting
Authors A. Augusto David M. Pera H. J. Choi P. Bellanger M. C. Brito J. Maia Alves A. M. Vallera T. Buonassisi Joao Serra
Groups
Journal JOURNAL OF APPLIED PHYSICS
Year 2013
Month February
Volume 113
Number 8
Pages
Abstract We investigate the relationships between growth rate, time-temperature profile, residual stress, dislocation density, and electrical performance of silicon ribbons grown via optical zone melting. The time-temperature profiles of ribbons grown at different velocities were investigated using direct measurements and computational fluid dynamics (CFD) modeling. Residual stresses up to 20 MPa were measured using infrared birefringence imaging. The effect of crystallization speed on dislocation density and residual stress is discussed from the context of thermal stresses during growth. More broadly, we demonstrate the usefulness of combining spatially resolved stress and microstructure measurements with CFD simulations toward optimizing kerfless silicon wafer quality. (C) 2013 American Institute of Physics. [http://dx.doi.org/10.1063/1.4793319]
DOI http://dx.doi.org/10.1063/1.4793319
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Publisher
Book Title
ISSN 0021-8979
EISSN
Conference Name
Bibtex ID ISI:000315667500021
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